Comparaison de différentes analyses statistiques spatiales pour détecter une défaillance dans la fabrication de circuits intégrés

Caroline Le Gall

Revue de Statistique Appliquée (2004)

  • Volume: 52, Issue: 1, page 5-37
  • ISSN: 0035-175X

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Le Gall, Caroline. "Comparaison de différentes analyses statistiques spatiales pour détecter une défaillance dans la fabrication de circuits intégrés." Revue de Statistique Appliquée 52.1 (2004): 5-37. <http://eudml.org/doc/106543>.

@article{LeGall2004,
author = {Le Gall, Caroline},
journal = {Revue de Statistique Appliquée},
language = {fre},
number = {1},
pages = {5-37},
publisher = {Société française de statistique},
title = {Comparaison de différentes analyses statistiques spatiales pour détecter une défaillance dans la fabrication de circuits intégrés},
url = {http://eudml.org/doc/106543},
volume = {52},
year = {2004},
}

TY - JOUR
AU - Le Gall, Caroline
TI - Comparaison de différentes analyses statistiques spatiales pour détecter une défaillance dans la fabrication de circuits intégrés
JO - Revue de Statistique Appliquée
PY - 2004
PB - Société française de statistique
VL - 52
IS - 1
SP - 5
EP - 37
LA - fre
UR - http://eudml.org/doc/106543
ER -

References

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  2. Besag J. (1974), Spatial Interaction and the Statistical Analysis of Lattice Systems. Journal of the Korean Statistical Society, vol. 2, pp. 192-236. Zbl0327.60067MR373208
  3. Breiman J., Friedman J., Olshen R. et Stone C. (1984), Classification and Regression Trees. Wadsworth & Brooks. Zbl0541.62042
  4. Cliff A.D., Ord J.K. (1981), Spatial Processes, Models and Applications, London: Pion Limited. Zbl0598.62120MR632256
  5. Comets F. (1992), On Consistency of a Class of Estimators for Exponential Families of Markov Random Fields on the Lattice. The Annals of Statitics, vol. 20, pp. 455-468. Zbl0787.62100MR1150354
  6. Cressie N.A.C. (1991), Statistics for Spatial Data. New York, Wiley. Zbl0799.62002MR1127423
  7. Duvivier F. (1999), Automatic Detection of Spatial Signature on Wafermaps in a High Volume Production. Internal Symposium on Defect and Fault Tolerance in VLSI Systems, pp. 61-66. 
  8. Hansen M.H., Nair V.N. et Friedman D.J. (1997), Monitoring Wafer Map Data From Integrated Circuit Fabrication Processes for Spatially Clustered Defects. Technometrics, vol. 39, n° 3, pp. 241-253. Zbl0891.62074
  9. Hansen M.H., Nair V.N., James D.A. et Friedman D.J. (1997b), Model-Free Estimation of Defect Clustering in Integrated Circuit Fabrication. IEEE Transactions on Semiconductor Manufacturing, vol. 10, n° 3, pp. 344-359. 
  10. Longtin M.D., Wein L.M., Welsch R.E. (1996), Sequential Screening in Semiconductor Manufacturing, I : Exploiting Spatial Dependence. Operations Research, vol. 44, pp. 173-195. Zbl0847.90071
  11. Moran P.A.P. (1948), The Interpretation of Statistical Maps. Journal of the Royal Statistical Society, Series B, vol. 10, pp. 243-251. Zbl0035.08304MR29115
  12. Paz O., Lawson T.R., Jr (1977), Modification of Poisson statistics : Modeling defects induced by diffusion. IEEE Journal of Solid-State Circuits, vol. SC-12, pp. 540-546. 
  13. Stapper C.H., Armstrong F.M., et Saji K. (1983), Integrated Circuit Yield Statistics. Proceeding of the IEEE, vol. 71, n° 4, pp. 453-470. 

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