On the mathematical analysis and optimization of chemical vapor infiltration in materials science

Adi Ditkowski; David Gottlieb; Brian W. Sheldon

ESAIM: Mathematical Modelling and Numerical Analysis - Modélisation Mathématique et Analyse Numérique (2000)

  • Volume: 34, Issue: 2, page 337-351
  • ISSN: 0764-583X

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Ditkowski, Adi, Gottlieb, David, and Sheldon, Brian W.. "On the mathematical analysis and optimization of chemical vapor infiltration in materials science." ESAIM: Mathematical Modelling and Numerical Analysis - Modélisation Mathématique et Analyse Numérique 34.2 (2000): 337-351. <http://eudml.org/doc/193989>.

@article{Ditkowski2000,
author = {Ditkowski, Adi, Gottlieb, David, Sheldon, Brian W.},
journal = {ESAIM: Mathematical Modelling and Numerical Analysis - Modélisation Mathématique et Analyse Numérique},
keywords = {minimization of processing time; optimal pressure; computer simulation; optimal temperature; chemical vapor infiltration; gas phase; solid phase},
language = {eng},
number = {2},
pages = {337-351},
publisher = {Dunod},
title = {On the mathematical analysis and optimization of chemical vapor infiltration in materials science},
url = {http://eudml.org/doc/193989},
volume = {34},
year = {2000},
}

TY - JOUR
AU - Ditkowski, Adi
AU - Gottlieb, David
AU - Sheldon, Brian W.
TI - On the mathematical analysis and optimization of chemical vapor infiltration in materials science
JO - ESAIM: Mathematical Modelling and Numerical Analysis - Modélisation Mathématique et Analyse Numérique
PY - 2000
PB - Dunod
VL - 34
IS - 2
SP - 337
EP - 351
LA - eng
KW - minimization of processing time; optimal pressure; computer simulation; optimal temperature; chemical vapor infiltration; gas phase; solid phase
UR - http://eudml.org/doc/193989
ER -

References

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  3. [3] R. Aris, The Mathematical Theory of the Diffusion and Reaction in Permeable Catalysts, Oxford Umversity Press, London (1975). Zbl0315.76051
  4. [4] A. Ditkowski, D. Gottlieb and B. W. Sheldon, Optimization of Chemical Vapor Infiltration with Simultaneous Powder Formation. J. Mater. Res. (submitted). Zbl0962.76083
  5. [5] H.-C. Chang, Minimizing Infiltration Time during Isothermal Chemical Vapor Infiltration, Ph.D. thesis, Brown Umversity (1995). 
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  11. [11] H.-C. Chang, T. F. Morse and B. W. Sheldon, J. Am. Ceram. Soc. 7 (1997) 1805-1811. 
  12. [12] H.-C. Chang, D. Gottlieb, M. Marion and B. W. Sheldon, J. of Scientific Computing 13 (1998) 303-321. Zbl0933.76089MR1656916
  13. [13] P. Loll, P. Delhaes, A. Pacault and A. Pierre, Carbon 13 (1975) 159. 
  14. [14] P. Delhaes, in Electrochemical Society Proceedings 97-25, M.D. Allendorf and C. Bernard Eds. (Electrochemical Society) (1997) 486-495. 
  15. [15] T. M. Besmann, Oak Ridge National Laboratory, unpublished results (1998). 
  16. [16] S. Bammidipati, G.D. Stewart, G.R. Jr. Elliott, S.A. Gokoglu and M.J. Purdy, AIChE Journal 42, No. 11, (1996) 3123-3132. 
  17. [17] T.M. Besmann, J.W. Klett and T.D. Burchell, in MRS Symposium Proceedings (Materials Research Society, Pittsburgh, 1998) 365-370. 

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