On the Mathematical Analysis and Optimization of Chemical Vapor Infiltration in Materials Science

Adi Ditkowski; David Gottlieb; Brian W. Sheldon

ESAIM: Mathematical Modelling and Numerical Analysis (2010)

  • Volume: 34, Issue: 2, page 337-351
  • ISSN: 0764-583X

Abstract

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In this paper we present an analysis of the partial differential equations that describe the Chemical Vapor Infiltration (CVI) processes. The mathematical model requires at least two partial differential equations, one describing the gas phase and one corresponding to the solid phase. A key difficulty in the process is the long processing times that are typically required. We address here the issue of optimization and show that we can choose appropriate pressure and temperature to minimize these processing times.

How to cite

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Ditkowski, Adi, Gottlieb, David, and Sheldon, Brian W.. "On the Mathematical Analysis and Optimization of Chemical Vapor Infiltration in Materials Science." ESAIM: Mathematical Modelling and Numerical Analysis 34.2 (2010): 337-351. <http://eudml.org/doc/197570>.

@article{Ditkowski2010,
abstract = { In this paper we present an analysis of the partial differential equations that describe the Chemical Vapor Infiltration (CVI) processes. The mathematical model requires at least two partial differential equations, one describing the gas phase and one corresponding to the solid phase. A key difficulty in the process is the long processing times that are typically required. We address here the issue of optimization and show that we can choose appropriate pressure and temperature to minimize these processing times. },
author = {Ditkowski, Adi, Gottlieb, David, Sheldon, Brian W.},
journal = {ESAIM: Mathematical Modelling and Numerical Analysis},
keywords = {Composites; chemical vapor deposition (CVD); optimization; computer simulation; theory.; minimization of processing time; optimal pressure; computer simulation; optimal temperature; chemical vapor infiltration; gas phase; solid phase},
language = {eng},
month = {3},
number = {2},
pages = {337-351},
publisher = {EDP Sciences},
title = {On the Mathematical Analysis and Optimization of Chemical Vapor Infiltration in Materials Science},
url = {http://eudml.org/doc/197570},
volume = {34},
year = {2010},
}

TY - JOUR
AU - Ditkowski, Adi
AU - Gottlieb, David
AU - Sheldon, Brian W.
TI - On the Mathematical Analysis and Optimization of Chemical Vapor Infiltration in Materials Science
JO - ESAIM: Mathematical Modelling and Numerical Analysis
DA - 2010/3//
PB - EDP Sciences
VL - 34
IS - 2
SP - 337
EP - 351
AB - In this paper we present an analysis of the partial differential equations that describe the Chemical Vapor Infiltration (CVI) processes. The mathematical model requires at least two partial differential equations, one describing the gas phase and one corresponding to the solid phase. A key difficulty in the process is the long processing times that are typically required. We address here the issue of optimization and show that we can choose appropriate pressure and temperature to minimize these processing times.
LA - eng
KW - Composites; chemical vapor deposition (CVD); optimization; computer simulation; theory.; minimization of processing time; optimal pressure; computer simulation; optimal temperature; chemical vapor infiltration; gas phase; solid phase
UR - http://eudml.org/doc/197570
ER -

References

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  11. H.-C. Chang, T.F. Morse and B.W. Sheldon, J. Am. Ceram. Soc.7 (1997) 1805-1811.  
  12. H.-C. Chang, D. Gottlieb, M. Marion and B.W. Sheldon, J. of Scientific Computing13 (1998) 303-321.  Zbl0933.76089
  13. P. Loll, P. Delhaes, A. Pacault and A. Pierre, Carbon13 (1975) 159.  
  14. P. Delhaes, in Electrochemical Society Proceedings 97-25, M.D. Allendorf and C. Bernard Eds (Electrochemical Society) (1997) 486-495.  
  15. T.M. Besmann, Oak Ridge National Laboratory, unpublished results (1998).  
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  17. T.M. Besmann, J.W. Klett and T.D. Burchell, in MRS Symposium Proceedings (Materials Research Society, Pittsburgh, 1998) 365-370.  

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